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Main Business

ESC(Electrostatic Chuck)

ESC(Electrostatic Chuck)
 
Electrostatic Chuck (ESC) plays a pivotal role in Etcher equipment, a critical component in semiconductor etching process technology. With extensive expertise and advanced technological capabilities, we specialize in joint development with leading semiconductor equipment manufacturers, while achieving successful localization of ESC systems.
Leveraging our proprietary manufacturing techniques, including Multi-Layer Ceramic (MLC) technology and hot press methods, we design, produce, and supply high-performance ESC solutions tailored to the diverse requirements of our customers. Our commitment to innovation and precision ensures that our ESC systems deliver exceptional reliability and performance, driving forward the advancements of semiconductor manufacturing processes.

ESC electro static chuck

Advanced AlN Heaters for Semiconductor Applications

AlN Heater
  
Our Aluminum Nitride (AlN) heaters represent cutting-edge technology in thermal management solutions, specifically designed to meet the stringent demands of semiconductor manufacturing processes. AlN, renowned for its superior thermal conductivity, exceptional mechanical strength, and high-temperature stability, serves as the ideal material for precision heating applications within the semiconductor industry.
Leveraging state-of-the-art manufacturing techniques, we provide highly reliable AlN heaters that deliver uniform and accurate temperature control, ensuring optimal performance in critical processes such as wafer handling, etching, deposition, and testing. Our heaters are engineered to withstand extreme conditions, with unmatched efficiency and durability, enabling manufacturers to achieve higher productivity and superior quality standards.
With our commitment to innovation and tailored solutions, we partner with customers to develop AlN heaters that align perfectly with their operational requirements, driving excellence across the semiconductor value chain.

aln heater.png

High-Performance Ceramic Components for Etching & Deposition Equipment

Y2O3 / Si / SiC / Al2O3 / AlN
   
At Aram Technology, we specialize in manufacturing advanced ceramic components optimized for semiconductor etching and deposition systems. Our materials are engineered for superior performance in high-temperature, high-plasma, and corrosive environments—ensuring reliability and longevity in the most demanding semiconductor processes.

Key Materials We Manufacture

  • Yttrium Oxide (Y₂O₃):
    Exceptional plasma resistance and thermal stability make Y₂O₃ ideal for inner walls and chamber liners in etch and CVD/ALD equipment.

  • Silicon Carbide (SiC):
    Combining extreme hardness with excellent thermal conductivity and chemical resistance, SiC is a preferred choice for focus rings, susceptors, and showerheads.

  • High-Purity Silicon (Si):
    Widely used in electrostatic chucks (ESC), wafers, and consumable parts for deposition processes. Offers outstanding process compatibility and uniformity.

  • Aluminum Oxide (Al₂O₃):
    Cost-effective and versatile, Al₂O₃ provides a strong balance of insulation, mechanical strength, and moderate plasma resistance for various structural components.

  • Aluminum Nitride (AlN):
    With excellent thermal conductivity and dielectric strength, AlN is ideal for heater bases and ESCs, contributing to process efficiency and precise temperature control.

Y2O3 ceramic
Si ceramic

Applications

  • Electrostatic Chucks (ESC)

  • Focus Rings & Edge Rings

  • Showerheads & Gas Diffusers

  • Heater Bases & Wafer Pedestals

  • Chamber Liners & Insulators

Why Choose Us?

  • Precision Machining & Custom Fabrication

  • Material Expertise for Process Optimization

  • Proven Performance with Global Semiconductor Leaders

  • Cleanroom Manufacturing & Strict Quality Control

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